Nonvolatile semiconductor memory and a fabrication method for the same

ABSTRACT

A nonvolatile semiconductor memory includes a plurality of memory cell transistors configured with a first floating gate, a first control gate, and a first inter-gate insulating film each arranged between the first floating gate and the first control gate, respectively, and which are aligned along a bit line direction; device isolating regions disposed at a constant pitch along a word line direction making a striped pattern along the bit line direction; and select gate transistors disposed at each end of the alignment of the memory cell transistors, each configured with a second floating gate, a second control gate, a second inter-gate insulator film disposed between the second floating gate and the second control gate, and a sidewall gate electrically connected to the second floating gate and the second control gate.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a continuation application of U.S. application Ser.No. 10/971,161, filed Oct. 25, 2004 and based upon and claims thebenefit of priority from prior Japanese Patent Application P2004-067712filed on Mar. 10, 2004; the entire contents of which are incorporated byreference herein.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to electrically erasable programmableread-only nonvolatile semiconductor memory (EEPROM).

2. Description of the Related Art

Conventionally, an electrically erasable programmable read-only memory(EEPROM), which electrically performs data write-in and erasure, forexample, has been known as a nonvolatile semiconductor memory (NonPatent Reference 1: R. Shirota, ‘A Review of 256-Mbit NAND FlashMemories and NAND Flash Future Trend’, Non-Volatile Semiconductor MemoryWorkshop (NVSMW) 2000, p. 0.22-31). In this EEPROM, especially a NANDtype, a memory cell array is configured by disposing memory cells at therespective intersections of horizontal word lines and vertical bitlines. A MOS transistor having a ‘stacked gate structure’ configured bystacking a floating gate (FG) and a control gate (CG), for example, istypically used as a memory cell.

There are a number of conventional methods for forming the gateelectrode of a select gate transistor such as electrically connecting afloating gate and a control gate by etching a part of the inter-gateinsulating film of the select gate transistor. However, with any ofthese methods, as miniaturization progresses, processing becomesdifficult when the floating gate is particularly a thin film.

SUMMARY OF THE INVENTION

A first aspect of the present invention inheres in a nonvolatilesemiconductor memory including: a plurality of memory cell transistors,configured with a first floating gate, a first control gate, and a firstinter-gate insulating film disposed between the first floating gate andthe first control gate, respectively, and aligned along a bit linedirection; device isolating regions disposed at a constant pitch along aword line direction making a striped pattern along the bit linedirection; and select gate transistors, disposed at each end of thealignment of the plurality of memory cell transistors, each of theselect gate transistors configured with a second floating gate, a secondcontrol gate, a second inter-gate insulator film disposed between thesecond floating gate and the second control gate, and a sidewall gateelectrically connected to the second floating gate and the secondcontrol gate.

A second aspect of the present invention inheres in a fabrication methodfor a nonvolatile semiconductor memory including: forming a polysiliconlayer for floating gates, and then forming an etching trench for deviceisolating region formation by selectively removing the polysilicon layerfor the floating gates; forming a device isolating region by depositingan insulator film across the entire surface of the device for filling inthe etching trench, and then planarizing until exposing the polysiliconlayer for floating gates; successively depositing an inter-gateinsulating film, a control gate, and a mask insulator film across theentire planarized surface; successively removing select gate transistorsin an area other than a memory cell transistor area, the mask insulatorin a peripheral transistor area, the control gate, and the inter-gateinsulator film, and then etching the filling material of the deviceisolating region such that the surface of the device isolating regioncan be at a lower position than the bottom of the inter-gate insulatorfilm; depositing a conductive material for sidewall gates across theentire surface of the device, and then selectively etching to leave onlysidewall gates; and forming isolated memory cell transistor areas andselect gate transistor areas.

A third aspect of the present invention inheres in a fabrication methodfor nonvolatile semiconductor memory including: forming a polysiliconlayer for floating gates, and then forming an etching trench for deviceisolating region formation by selectively removing the polysilicon layerfor floating gates; forming a device isolating region by depositing aninsulator film across the entirety for filling in the etching trench,and then planarizing until exposing the polysilicon layer for thefloating gates; successively depositing an inter-gate insulating film, acontrol gate, and a mask insulator film across the entire planarizedsurface; successively removing select gate transistors in an area otherthan a memory cell transistor area, the mask insulator in a peripheraltransistor area, the control gate, and the inter-gate insulator film,and then etching the filling material of the device isolating regionsuch that the surface of the device isolating region is at a lowerposition than the bottom of the inter-gate insulator film; depositing aconductive material for sidewall gates, and then etching until exposingthe surface of the mask insulator film, and stopping the etching processat the top of the floating gates so as to form sidewall gates; andforming isolated memory cell transistor areas and select gate transistorareas.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is a schematic aerial pattern diagram of a NAND nonvolatilesemiconductor memory according to a comparative example of the presentinvention;

FIG. 2 is a schematic device cross-sectional diagram cut along the lineIV-IV of FIG. 1;

FIG. 3 is a schematic aerial pattern diagram of a nonvolatilesemiconductor memory according to a first embodiment of the presentinvention;

FIG. 4 is a schematic device cross-sectional diagram of the nonvolatilesemiconductor memory according to the first embodiment of the presentinvention;

FIG. 5 is a schematic device cross-sectional diagram illustrating a stepof a nonvolatile semiconductor memory fabrication method according tothe first embodiment of the present invention;

FIG. 6 is a schematic device cross-sectional diagram cut along the lineI-I of FIG. 5;

FIG. 7 is a schematic cross-sectional diagram illustrating a step of thenonvolatile semiconductor memory fabrication method according to thefirst embodiment of the present invention;

FIG. 8 is a schematic cross-sectional diagram illustrating a step of thenonvolatile semiconductor memory fabrication method according to thefirst embodiment of the present invention;

FIG. 9 is a schematic device cross-sectional diagram cut along the lineI-I of FIG. 8;

FIG. 10 is a schematic cross-sectional diagram illustrating a step ofthe nonvolatile semiconductor memory fabrication method according to thefirst embodiment of the present invention;

FIG. 11 is a schematic device cross-sectional diagram cut along the lineI-I of FIG. 10;

FIG. 12 is a schematic cross-sectional diagram illustrating a step ofthe nonvolatile semiconductor memory fabrication method according to thefirst embodiment of the present invention;

FIG. 13 is a schematic device cross-sectional diagram cut along the lineI-I of FIG. 12;

FIG. 14 is a schematic cross-sectional diagram illustrating a modifiedexample of a step of the nonvolatile semiconductor memory fabricationmethod according to the first embodiment of the present invention;

FIG. 15 is a schematic cross-sectional diagram illustrating a step ofthe nonvolatile semiconductor memory fabrication method according to thefirst embodiment of the present invention;

FIG. 16 is a schematic device cross-sectional diagram cut along the lineI-I of FIG. 15;

FIG. 17 is a schematic cross-sectional diagram illustrating a step ofthe nonvolatile semiconductor memory fabrication method according to thefirst embodiment of the present invention;

FIG. 18 is a schematic cross-sectional diagram illustrating a step ofthe nonvolatile semiconductor memory fabrication method according to thefirst embodiment of the present invention;

FIG. 19 is a schematic cross-sectional diagram illustrating thenonvolatile semiconductor memory according to the first embodiment ofthe present invention, and a step of the fabrication method thereof;

FIG. 20 is a schematic device cross-sectional diagram cut along the lineIII-III of FIG. 18 or FIG. 19;

FIG. 21 is a schematic device cross-sectional diagram cut along the lineII-II of FIG. 18 or FIG. 19;

FIG. 22 is a schematic cross-sectional diagram illustrating a step ofthe nonvolatile semiconductor memory fabrication method according to thefirst embodiment of the present invention;

FIG. 23 is a schematic cross-sectional diagram illustrating a step of anonvolatile semiconductor memory fabrication method according to a firstembodiment of the present invention;

FIG. 24 is a schematic device cross-sectional diagram illustrating astep of a nonvolatile semiconductor memory fabrication method accordingto a second embodiment of the present invention;

FIG. 25 is a schematic device cross-sectional diagram cut along the lineI-I of FIG. 24;

FIG. 26 is a schematic device cross-sectional diagram illustrating astep of the nonvolatile semiconductor memory fabrication methodaccording to the second embodiment of the present invention;

FIG. 27 is a schematic device cross-sectional diagram illustrating astep of the nonvolatile semiconductor memory fabrication methodaccording to the second embodiment of the present invention;

FIG. 28 is a diagram showing an exemplary NAND circuit structure of anonvolatile semiconductor memory according to a third embodiment of thepresent invention;

FIG. 29 is a diagram showing an exemplary AND circuit structure of anonvolatile semiconductor memory according to a fourth embodiment of thepresent invention;

FIG. 30 is a diagram showing an exemplary NOR circuit structure of anonvolatile semiconductor memory according to a fifth embodiment of thepresent invention;

FIG. 31 is a diagram showing an exemplary system block structure of anonvolatile semiconductor memory according to a sixth embodiment of thepresent invention; and

FIG. 32 illustrates an application example for the nonvolatilesemiconductor memory according to the first through the sixth embodimentof the present invention, and is a seventh embodiment of the presentinvention.

DETAILED DESCRIPTION OF THE INVENTION

Various embodiments of the present invention will be described withreference to the accompanying drawings. It is to be noted that the sameor similar reference numerals are applied to the same or similar partsand elements throughout the drawings, and the description of the same orsimilar parts and elements will be omitted or simplified.

Generally and as it is conventional in the representation of the circuitblocks, it will be appreciated that the various drawings are not drawnto scale from one figure to another nor inside a given figure, and inparticular that the circuit diagrams are arbitrarily drawn forfacilitating the reading of the drawings.

In the following descriptions, numerous specific details are set forthsuch as specific signal values, etc. to provide a thorough understandingof the present invention. However, it will be obvious to those skilledin the art that the present invention may be practiced without suchspecific details. In other instances, circuits well-known have beenshown in block diagram form in order not to obscure the presentinvention in unnecessary detail.

Embodiments of the present invention are described forthwith whilereferencing the drawings. The same or similar symbols are applied to thesame or similar parts throughout the appended drawings. In addition, theembodiments given forthwith illustrate devices and methods for embodyingthe technical idea of the present invention, and that technical idea ofthe present invention is not limited to the following. The technicalidea of the present invention may be modified into various modificationswithin the scope of the appended claims.

The nonvolatile semiconductor memory according to the embodiments of thepresent invention eliminates difficulties encountered during thefabrication process provides, precise fabrication of a minute stackedgate structure of a memory cell transistor region, and permits easyformation of connection between the floating gate and the control gateof each peripheral select gate transistor via a sidewall, as well asincrease in select gate direction and control of cut-off characteristicseven when a floating gate layer is thin or in addition, when a film suchas an alumina film, which is difficult to be dry etched, is used as aninter-gate insulating film.

COMPARATIVE EXAMPLE

In a schematic top plan view pattern diagram of a nonvolatilesemiconductor memory with a NAND-type EEPROM structure as a comparativeexample of the present invention, as shown in FIG. 1, memory celltransistors with a stacked gate structure are disposed in active regionsAA_(i) and AA_(i+1) sandwiched between device isolating regions such asshallow trench isolations (STIs). The serially connected memory celltransistors have select gate transistors each connected to a select gateline SG disposed at the ends of a NAND memory cell unit. In addition,the control gate of each memory cell transistor is connected to acorresponding one of word lines WL0, WL1, WL2, WL3, . . . .

FIG. 2, which is a schematic device cross-sectional structure cut alongthe line IV-IV of FIG. 1, shows memory cell transistor areas and selectgate transistor areas of a NAND-type serial structure. In the top planview pattern diagram of FIG. 1, the lines I-I, II-II, and III-IIIcorrespond to the lines I-I, II-II, and III-III in FIG. 2, respectively.

Each NAND-type memory cell transistor area includes diffusion layers 18formed in a p-well region or a semiconductor substrate 26, a gateinsulator film 30, which acts as a tunneling insulator film, formed onthe p-well or the semiconductor substrate 26, a floating gate 8, whichis disposed on the gate insulator film 30, a control gate 2, which isdisposed on the floating gate 8 via an inter-gate insulator film 7 suchas an alumina film, and a salicide film 46, which is disposed on thecontrol gate 2.

Each select gate transistor area includes diffusion layers 18 formed ina p-well region or a semiconductor substrate 26, a gate insulator film30 formed on the p-well or the semiconductor substrate 26, a floatinggate 8, which is disposed on the gate insulator film 30, a control gate2, which is disposed on the floating gate 8 via a polysilicon contact 10formed in an inter-gate insulator film 7, and a salicide film 46, whichis disposed on the control gate 2. In other words, in the select gatetransistor area, the floating gate 8 and the control gate 2 areshort-circuited via the polysilicon contact 10.

Conventional formation methods for the gate electrode of the select gatetransistor of the comparative example, include methods of providing aconducting connection between the floating gates 8 and the control gates2 by removing, through etching, a part of the gate electrodes 7 of theselect gate transistor. However, with any of the conventional methods,as miniaturization continues, processing becomes difficult when thefloating gate 8 is particularly a thin film.

FIRST EMBODIMENT

A schematic device cross-sectional structure of a nonvolatilesemiconductor device according to a first embodiment of the presentinvention, as shown in FIG. 4, corresponds to a schematic devicecross-sectional structure cut along the line IV-IV in a schematic topplan view pattern diagram of FIG. 3.

The nonvolatile semiconductor device according to the first embodimentof the present invention, as shown in FIGS. 3 and 4, includes memorycell transistors Q_(cn), Q_(c(n−1)), Q_(c(n−2)), . . . aligned along thebit line BL direction, each of the memory cell transistors has a firstfloating gate 81, a first control gate 121, and a first inter-gateinsulator film 71 disposed between the first floating gate 81 and thefirst control gate 121; device isolating regions STI, disposed at aconstant pitch along the direction of word lines WL0, WL1, WL2, WL3, . .. so as to form a striped pattern along the bit line BL direction; andselect gate transistors Q_(s), each having a second floating gate 82, asecond control gate 122, a second inter-gate insulator film 72 disposedbetween the second floating gate 82 and the second control gate 122, anda sidewall gate 6 electrically connected to the second floating gate 82and the second control gate 122.

In addition, the memory cell transistors Q_(cn), Q_(c(n−1)), Q_(c(n−2)),. . . and select gate transistors Q_(s) in the examples of FIGS. 3 and 4are formed on the p-well region or the semiconductor substrate 26 andinclude the gate insulator film 30 and the diffusion layers 18,respectively. The diffusion layers 18 of the memory cell transistorsQ_(cn), Q_(c(n−1)), Q_(c(n−2)), Q_(c(n−3)), . . . are source and drainregions connected in series thereto, and represent source and drainregions for the select gate transistors Q_(s) at respective arrayed endsof the multiple memory cell transistors Q_(cn), Q_(c(n−1)), Q_(c(n−2)),Q_(c(n−3)), . . . .

The sidewall gates 6 are disposed on one respective sidewall of thesecond inter-gate insulator films 72 and the control gates 122. Thesidewall gates 6 are in electrical contact with the second control gates122. Further, the bottom of the sidewall gates 6 are in electricalcontact with the entire or at least a part of the surface of the secondfloating gates 82. As a result, the second control gates 122 and thesecond floating gates 82 of the select gate transistors Q_(s) areelectrically short-circuited via the sidewall gates 6.

FIG. 4 schematically shows that first sidewall gate oxide films 91 madeof a conductive thin oxide film or an oxide are formed on the interfacebetween the sidewall gates 6 and the control gates 122. Similarly,second sidewall gate oxide films 92 are made of a conductive thin oxidefilm or an oxide, are formed on the interface between the sidewall gates6 and the second floating gates 82. These first sidewall gate oxidefilms 91 and second sidewall gate oxide films 92 may be formed asnatural oxide films, and may be in an island shape.

Such first sidewall gate oxide films 91 and second sidewall gate oxidefilms 92 are thin natural oxide films, which are formed at the time ofdeposition and formation of the second floating gates 82, the secondcontrol gates 122, and the sidewall gates 6 at different times duringthe fabrication process.

Furthermore, such first sidewall gate oxide films 91 and second sidewallgate oxide films 92 are made of a conductive thin oxide film or aconductive oxide, and do not influence contact characteristics betweenthe sidewall gates 6 and the second control gates 122, or between thesidewall gates 6 and the second floating gates 82. With the followingdescription of the fabrication method, description of the first sidewallgate oxide films 91 and second sidewall gate oxide films 92 is omittedas they are natural oxide films or oxides.

The widths of the first inter-gate insulator films 71 and the secondinter-gate insulator films 72 arranged along the bit line BL direction(column direction) shown in FIG. 4 need not be equal. For favorablecut-off characteristics of the select gate transistors Q_(s), the widthof the second inter-gate insulator films 72 should be formed wider thanthat of the first inter-gate insulator films 71.

The first floating gates 81, the first inter-gate insulator films 71,and the first control gates 121, which represent the structure of thememory cell transistors Q_(cn), Q_(c(n−1)), Q_(c(n−2)), Q_(c(n−3)), . .. , correspond to the second floating gates 82, the second inter-gateinsulator films 72, and the second control gates 122, which representthe structure of each select gate transistor Q_(s) and are made of thesame material as they are formed simultaneously during the fabricationprocess.

Furthermore, with the example of FIG. 4, salicide films 46 arerespectively disposed on the first control gates 121 and the secondcontrol gates 122. The salicide films 46 are effective in reducing theresistance of the first control gates 121 and the second control gates122. Note that a simpler structure without forming the salicide films 46may be employed.

(Fabrication Method)

To begin with, as shown in FIG. 5, after gate oxidation so as to formthe gate insulating film (tunnel oxide film) 30 for a memory celltransistor or a select gate transistor, floating gates 8 are formed onthe p-well region or the semiconductor substrate 26. The floating gates8 may be made of a polysilicon layer, for example.

Note that subsequently, an insulator film, which can be utilized as astopper film during chemical mechanical polishing, may be deposited onthe floating gates 8.

The schematic device cross-sectional diagram cut along the line I-I ofFIG. 5, as shown in FIG. 6, includes the p-well or the semiconductorsubstrate 26 as in FIG. 5, the gate insulating film (tunnel oxide film)30 for a memory cell transistor or a select gate transistor, and thefloating gate 8 comprising a polysilicon layer, for example. Theposition of the line I-I of FIG. 5 corresponds to the line I-I of FIG.3, which is a corresponding aerial pattern diagram.

Subsequent to the cross-section cut along the line I-I shown in FIG. 6,as shown in FIG. 7, once a resist is applied and patterned, apolysilicon layer, for example, for the floating gates 8 is selectivelyremoved through dry etching such as reactive ion etching (RIE), the gateinsulator film 30 is removed, and through further RIE, etching trenches9 are formed for formation of device isolating regions such as STIs.

As shown in FIG. 8 and FIG. 9, which illustrates a device cross-sectioncut along the line I-I of FIG. 8, an insulator film such as atetraethoxydisilane (TEOS) film, for example, is deposited across theentire surface of the device so as to fill in the etching trenches 9,and using chemical mechanical polishing techniques (CMP), the TEOS filmor the like is polished until the polysilicon layer for the floatinggates 8 is exposed, forming device isolating regions 28. Furthermore, aninter-gate insulator film 7 such as an alumina film is deposited acrossthe entire polished surface. Polysilicon, for example, is deposited forthe control gates 2, and then a mask insulator film 40 is formed. Notethat as explained above, an insulator film, which can be utilized as astopper film during chemical mechanical polishing (CMP), may bedeposited on the floating gates 8. In this case, the device surface isnot always necessarily polished.

Note that the inter-gate insulating film 7 may have a structureincluding not only an aluminum oxide such as the alumina film or thelike, but a single layer or a multi-layered film made of a hafniumoxide, a silicon oxide, a silicon nitride and/or a zirconium oxide.

As shown in FIG. 10, the mask insulator film 40, the control gate 2, andthe inter-gate insulating film 7 in the peripheral transistor area andthe select gate transistor area other than the memory cell transistorarea are removed through lithography and etching. Here, as shown in FIG.11, which is a device cross-sectional structure cut along the line I-Iof FIG. 10, the material filled in the device isolating regions 28 isetched such that the top surface of the device isolating regions 28 islower than the top surface of the floating gates 8 in the etched regionsof FIG. 10. Formation of the surface of the device isolating regions 28at a lower position prevents short circuits between neighboring floatinggates 8. As a result, the top surface of the device isolating regions 28is formed so as to be lower than the bottom of the inter-gate insulatorfilm 7.

As shown in FIG. 12, a conductive material such as a polysilicon isuniformly deposited across the entire surface of the device for thesidewall gate 6. FIG. 13 shows a schematic device cross-sectionalstructure cut along the line I-I of FIG. 12, illustrating a conductivematerial such as a polysilicon being uniformly deposited across theentire surface of the device for the sidewall gate 6.

In this case, compared to the structure of the floating gates 8 and thecontrol gates 2 shown in FIG. 2, for example, electrically connected viathe polysilicon contacts 10, a structure with the floating gates 8 andthe control gates 2 at the sidewall portions reliably electricallyconnected via the polysilicon, for the sidewall gates 6 is provided.Thus, as miniaturization progresses, formation of a structure in whichconnection between the floating gates 8 and the control gates 2 iseasier is possible.

FIG. 14 is a schematic cross-sectional diagram illustrating a modifiedexample of a step of the nonvolatile semiconductor memory fabricationmethod according to the first embodiment of the present invention. Inthe step of FIG. 10, when removing the inter-gate insulator film 7 onthe floating gate 8 through lithography and etching, a step of leaving aportion thereof on the floating gate 8, through masking, may beemployed. In this case, instead of the structure shown in FIG. 12, thestructure has the inter-gate insulator film 7 remaining on a portion ofthe interface between the sidewall gate 6 and the floating gate 8, asshown in FIG. 14. The final device structure is formed with the secondinter-gate insulator film 72 remaining between the sidewall gate 6 andthe second floating gate 82.

As shown in FIG. 15, the polysilicon for the sidewall gate 6 is etchedacross the entire surface of the device through anisotropic etching,leaving only the sidewall gate 6. FIG. 16 shows the devicecross-sectional structure cut along the line I-I of FIG. 15. As aresult, the top surface of the device isolating regions 28 is formed ata position lower than the top surface of the device isolating regions 28of FIG. 9.

As shown in FIG. 17, once the resist 60 is applied across the entiresurface of the device, memory cell transistor regions and select gatetransistor regions are formed and separated through lithography andetching. As a result, the first floating gates 81 and the secondfloating gates 82 are formed from the floating gate 8 and separated fromeach other. The first inter-gate insulator films 71 and the secondinter-gate insulator films 72 are formed from the inter-gate insulatorfilm 7 and separated from each other, and the first control gates 121and the second control gates 122 are formed from the control gate 2 andseparated from each other.

As shown in FIG. 18, once the resist 60 is removed, an ion implantationstep of implanting ions or an n-type dopant such as phosphorous (P) orarsenic (As) and an annealing step are carried out so as to form n⁺diffusion layers 18, which become source and drain regions for thememory cell transistors Q_(cn), Q_(c(n−1)), Q_(c(n−2)), . . . and theselect gate transistors Q_(s).

FIG. 20 shows a device cross-sectional structure cut along the lineIII-III of FIG. 18 or in other words, a cross-sectional structure cutalong the word line WL direction (row direction). The gate insulatorfilms 30 and the floating gates 8, which are formed on the p-well or thesemiconductor substrate 26, are isolated, along the word line WLdirection, from each other by the device isolating regions 28. Disposedthereon are the control gate 2 and the mask insulator film 40 via theinter-gate insulator film 7.

FIG. 21 shows a device cross-sectional structure cut along the lineII-II of FIG. 18 or in other words, a cross-sectional structure cutalong the word line WL direction. The diffusion layers 18 and the gateinsulator films 30 formed near the surface of the p-well or thesemiconductor substrate 16 are isolated, along the word line WLdirection, from each other by the device isolating regions 28. Thedevice isolating regions 28 being formed at a lower position than thatin FIG. 20 is the same as in FIG. 13.

Next, as shown in FIG. 22, once the mask insulator film 40 is removed, asalicide process may be carried out across the entire surface of thedevice, forming the salicide films 46 on the first control gates 121,the second control gate 122, and the diffusion layers 18 representingthe source and the drain region of the select gate transistor Q_(s).Note that thick interlayer insulator films 42 may be filled in betweenthe sidewall regions of the memory cell transistors Q_(cn), Q_(c(n−1)),Q_(c(n−2)), . . . .

The structure shown in FIGS. 3 and 4 corresponds to a structure with thethick interlayer insulator films 42 omitted in FIG. 22.

Subsequent to the process of FIG. 18, as shown in FIG. 23, once the maskinsulator film 40 is removed, a thick inter-layer insulator film 80 isdeposited across the entire surface of the device, and above the deviceisolating regions 28 in the peripheral areas, a via contact 12 as wellas a metallic material for a word line 14 are formed in a maskpatterning step. The control gate 2 is connected to the word line 14 bythe via contact 12.

FIG. 23 corresponds to a device cross-sectional structure cut along theword line WL direction, and represents a process subsequent to thestructure in FIG. 20, which represents the device cross-sectionalstructure cut along the line III-III.

Note that the control gate 2, the first control gates 121, and thesecond control gate 122 may be made not only of polysilicon, but in asingle layer of titanium, tungsten, or titanium nitride, or multi-levelsthereof. This configuration is advantageous in terms of miniaturization,as compared to polysilicon in that it can be easily thinly formed andhave low resistance.

Alternatively, the control gate 2, the first control gates 121, and thesecond control gates 122 may be made not only of polysilicon, but mayhave a salicide structure of a metal such as titanium, cobalt, ornickel.

Alternatively, the first control gates 121 may be connected to aninterconnect, for example, the word line WL made of a metal such astungsten (W), aluminum (Al), titanium (Ti), or copper (Cu). Similarly,the second control gates 122 may be connected to interconnects, forexample, select gate lines SGD, SGS or the like made of a metal such astungsten (W), aluminum (Al), titanium (Ti) or copper (Cu).

MODIFIED EXAMPLE OF THE FIRST EMBODIMENT

The structure of the modified example of the first embodiment of thepresent invention, as shown in FIG. 19, has the sidewall gates 6disposed on both sidewalls of the second inter-gate insulator film 72and the control gate 122 of each select gate transistors Q_(s). Comparedto the structure of the first embodiment with the sidewall gate 6disposed on one sidewall of the second inter-gate insulator film 72 andthe control gate 122, the area occupied by the select gate transistorincreases; however, by forming the sidewall gate 6 on both sides, thegate resistance of the select gate transistor Q_(s) is reduced, andcontrol characteristics such as cut-off characteristics may enhance.

Note that the fabrication method is the same as that of the nonvolatilesemiconductor memory according to the first embodiment of the presentinvention described in FIG. 5 through FIG. 18 with only a difference ofusing a different mask pattern.

FIG. 20 shows a schematic device cross-sectional structure cut along theline III-III of FIG. 19, or in other words, a cross-sectional structurecut along the word line WL direction. In addition, FIG. 21 shows aschematic device cross-sectional structure cut along the line II-II, orin other words, a cross-sectional structure cut along the word line WLdirection. The device isolating regions 28 being formed at a lowerposition than that of FIG. 20 is the same as that in FIG. 13. The restof the fabrication processed are the same as the processed in FIGS. 22and 23, and description thereof is omitted.

SECOND EMBODIMENT

The structure of a nonvolatile semiconductor memory according to asecond embodiment of the present invention is the same as that of thenonvolatile semiconductor memory according to the first embodiment shownin FIGS. 3 and 4.

With a nonvolatile semiconductor memory fabrication method according tothe second embodiment of the present invention, since the steps of FIG.5 through FIG. 14 are common to those of the first embodiment,description thereof is omitted.

Subsequent to the steps of FIGS. 12 and 13, as shown in FIG. 24, theentire surface is etched until the surface of the mask insulator film 40is exposed. Since a natural oxide film is formed on the surface of thefloating gate 8 in the step of FIG. 10, even with etching across theentire surface of the device, stopping at the top surface of thefloating gate 8 is easy. However, this is possible only if the etchingstops higher than the gate oxide film.

FIG. 25 shows a schematic device cross-sectional structure cut along theline I-I of FIG. 24. In FIG. 25, a part of the sidewall gates 6 is lefton the corresponding sidewall portion of each floating gate 8. Formationof the surface of the device isolating regions 28 at a low positionprevents short circuits of neighboring floating gates 8. If the surfaceof the device isolating regions 28 is substantially the same or higherthan the top of the floating gates 8 in the regions etched in the stepof FIG. 10, the polysilicon of the sidewall gates 6 remains on top ofthe floating gates 8, and the neighboring floating gates 8 may shortcircuit. Therefore, forming the surface of the device isolating regions28 at a low position and accurately etching the polysilicon for thesidewall gates 6 is important.

Next, as shown in FIG. 26, once the resist 60 is applied across theentire surface of the device, the mask insulator film 40, thepolysilicon for the control gate 2 and the inter-gate insulator film 7(71, 72) are removed, dividing the entire surface region of the deviceinto memory cell transistor regions and select gate transistor regionsthrough lithography and etching.

Next, as shown in FIG. 27, the floating gate 8 may be shallowly etchedby forming etching trenches 100. Making the etched surface end at thetop surface of the floating gate 8 is favorable to guarantee isolationcharacteristics between neighboring memory cell transistors, and endingthe etched surface higher than the gate oxide film 30 is necessary inorder to prevent from making damage to the gate oxide film 30 during thetrench etching process.

Next, as with the step illustrated in FIG. 18, once the resist 60 isremoved, the polysilicon for the floating gate 8 is removed through RIEor the like, and further through an ion implantation step. The diffusionlayers 18 of the memory cell transistors Q_(cn), Q_(c(n−1)), Q_(c(n−2)),. . . and the select gate transistors Q_(s) are formed.

Next, as with the step illustrated in FIG. 22, once the resist 40 isremoved, by carrying out a salicide process across the entire surface ofthe device, the salicide films 46 may be formed upon the first controlgates 121, the second control gates 122, and the diffusion layers 18,which represent the source and the drain regions of the select gatetransistors Q_(s). Note that thick inter-layer insulator films 42 may befilled in between the sidewall portions of the Q_(cn), Q_(c(n−1)),Q_(c(n−2)), . . . .

In FIG. 22, as is apparent from the structure shown in FIG. 4, whichcorresponds to a structure with the thick inter-layer insulator films 42omitted, the sidewall gate 6 remains in one sidewall portion of theselect gate transistor Q_(s), and the second floating gate 82 and thesecond control gate 122 short circuit. A structure short-circuited onboth sides may be employed as in FIG. 19.

Next, subsequent to the step of FIG. 18, as shown in FIG. 23, once themask insulator film 40 is removed, a thick inter-layer insulator film 80is deposited across the entire surface of the device, and through a maskpatterning step, the via contact 12 and a metallic material for the wordline 14 are formed upon the device isolating regions 28 in a peripheralarea. The control gate 2 is connected to the word line 14 by the viacontact 12.

FIG. 23 corresponds to a device cross-sectional structure cut along theword line WL direction, and represents a step subsequent to thestructure of FIG. 20, which represents the device cross-sectionalstructure cut along the line III-III.

Note that the control gate 2, the first control gates 121, and thesecond control gates 122 may be formed not only of polysilicon, but in asingle layer of titanium, tungsten, or titanium nitride, or multi-levelsthereof. This configuration is advantageous in terms of miniaturizationcompared to polysilicon in that it can be easily thinly formed and haslow resistance.

Alternatively, the control gate 2, the first control gates 121, and thesecond control gates 122 may have a salicide structure of not onlypolysilicon, but a metal such as titanium, cobalt, or nickel as well.

Alternatively, the first control gates 121 may be connected to aninterconnect, for example, the word line WL made of a metal such astungsten (W), aluminum (Al), titanium (Ti), or copper (Cu). Similarly,the second control gates 122 may be connected to interconnect, forexample, the select gate lines SGD, SGS or the like made of a metal suchas tungsten (W), aluminum (Al), titanium (Ti), or copper (Cu).

THIRD EMBODIMENT NAND Structure

A NAND structure is shown in FIG. 28 as an exemplary circuit structureof a nonvolatile semiconductor memory according to a third embodiment ofthe present invention. FIG. 28 shows an example configured with thenonvolatile semiconductor memory according to the first and the secondembodiment of the present invention structured as an exemplary NANDmemory cell array.

The select gate transistors have a structure with the second floatinggate 82, the second inter-gate insulator film 72, and the second controlgate 122 stacked upon the semiconductor substrate 26 via the gateinsulator film 30, and the second floating gate 82 and the secondcontrol gate 122 being short circuited due to the sidewall gate 6 as isdescribed in FIG. 3 through FIG. 27. Furthermore, the memory celltransistors having a structure with the first floating gate 81, thefirst inter-gate insulator film 71, and the first control gate 121 beingstacked upon the semiconductor substrate 26 via the gate insulating film30 is as described using FIG. 3 through FIG. 27.

Each NAND cell unit 24 is configured by serially connecting n memorycell transistors (MC1,m to MCn,m) so that adjacent memory celltransistors share either their source or drain diffusion layer, andfurther arranging a select gate transistor (SG1.m and SG2.m) at bothends thereof. A NAND memory cell array has the above NAND cell units 24arrayed in a matrix. The span of NAND cell units 24 in the same columnis a NAND cell block. The drain of one of the select gate transistors(SG1.m) for each NAND cell unit 24 is connected to the bit line (BLm),and the source of the other select gate transistor (SG2.m) is connectedto the source line (SL), which is shared by multiple NAND cell units 24.The control gates of multiple memory cell transistors and select gatetransistors horizontally arranged in the NAND memory cell array areconnected in common to control gate lines (word lines) WL and the selectgate lines SGD and SGS, respectively. All memory cell transistors 25connected to a single word line configure a range in which data write-incan be collectively performed. This write-in unit is normally defined asone page; however recently, there are cases where multiple pages areallotted to a single control gate. In the case where there are n memorycell transistors in the NAND cell unit 24, there are n control gatelines in a memory cell block. Bit lines BL1 and BL2 are connected to bitline drive circuits 1, respectively, the control gate lines WL areconnected to control gate line drive circuits 20, respectively, theselect gate lines are connected to select gate line drive circuits 21,respectively, and the source line is connected to a source line drivecircuit 22.

With the nonvolatile semiconductor memory according to the thirdembodiment of the present invention, even in the NAND-type circuitstructure, as miniaturization continues and the floating gate 8 is athin film, contact resistance decreases. Further, yield can be improvedwith easy processing due to a short-circuit structure utilizing thesidewall gates 6 in the select gate transistors.

Note that the number of select gate transistors is not limited to one,and a circuit structure with multiple select gate transistors connectedin series may be provided. Even in that case, as miniaturizationprogresses and the floating gate 8 is a thin film, contact resistancedecreases, and an improved yield can be anticipated with easy processingdue to a short-circuit structure utilizing the sidewall gates 6.

FOURTH EMBODIMENT AND Structure

An AND structure is shown in FIG. 29 as an exemplary circuit structureof a nonvolatile semiconductor memory according to a fourth embodimentof the present invention. FIG. 29 shows an example configured with thenonvolatile semiconductor memory according to the first and the secondembodiment of the present invention structured as an exemplary ANDmemory cell array.

The select gate transistors have a structure comprising the secondfloating gate 82, the second inter-gate insulator film 72, and thesecond control gate 122 stacked upon the semiconductor substrate 26 viathe gate insulator film 30, and the second floating gate 82 and thesecond control gate 122 being short circuited due to the sidewall gate6, as is described referencing FIG. 3 through FIG. 27. Furthermore, thememory cell transistors having a structure with the first floating gate81, the first inter-gate insulator film 71, and the first control gate121 being stacked upon the semiconductor substrate 26 via the gateinsulating film 30 is as described using FIG. 3 through FIG. 27.

The reference numeral 23 enclosed by a dotted line in FIG. 29 denotes anAND cell unit. In the AND cell unit 23, respective drain regions ofmemory cell transistors MO to M15 are connected in common, andrespective source regions are also connected in common. In other words,in a memory cell unit of an AND flash memory as shown in FIG. 29, thememory cell transistors MO to M15 are connected in parallel, where asingle bit line side select transistor SG1 is connected on one sidethereof, and a single source line side select transistor SG2 isconnected on the other side. Each of the memory cell transistors M0 toM15 is connected one to one to a word line WL0 to WL15, respectively.The gate of the bit line side select transistor SG1 is connected to theselect gate line SGD. The gate of the source line side select transistorSG2 is connected to the select gate line SGS. The drain of the bit lineside select transistor SGS1 is connected to the bit line BL, which is adata line. The source of the source line side select transistor SG2 isconnected to the source line SL.

With the nonvolatile semiconductor memory according to the fourthembodiment of the present invention, even in the AND-type circuitstructure, as miniaturization progresses and the floating gate 8 is athin film, contact resistance decreases, and yield is improved with easyprocessing due to a short-circuit structure utilizing the sidewall gates6 in the select gate transistors.

For securing select gate transistor cut-off characteristics, a structurewith not just one but multiple select gate transistors connected inseries may be employed. Even in that case, as miniaturization progressesand the floating gate 8 is a thin film, contact resistance decreases,and yield is improved with easy processing due to a short-circuitstructure utilizing the sidewall gates 6.

FIFTH EMBODIMENT NOR Structure

A divided bit line (DI) NOR structure is shown in FIG. 30 as anexemplary circuit structure of a nonvolatile semiconductor memoryaccording to a fifth embodiment of the present invention. FIG. 30 showsan example of the nonvolatile semiconductor memory according to thefirst and the second embodiment of the present invention structuredusing an exemplary NOR memory cell array.

The select gate transistors have a structure with the second floatinggate 82, the second inter-gate insulator film 72, and the second controlgate 122 stacked upon the semiconductor substrate 26 via the gateinsulator film 30, and the second floating gate 82 and the secondcontrol gate 122 being short circuited due to the sidewall gate 6, as isdescribed referencing FIG. 3 through FIG. 27. Furthermore, the memorycell transistors having a structure with the first floating gate 81, thefirst inter-gate insulator film 71, and the first control gate 121 beingstacked upon the semiconductor substrate 26 via the gate insulating film30 is as described using FIG. 3 through FIG. 27.

The reference numeral 27 enclosed by a dotted line in FIG. 30 denotes aNOR cell unit. In the NOR cell unit 27, the common source region of twoadjacent memory cell transistors is connected to the source line SL, andthe common drain region thereof is connected to the bit line BL. The NORcell unit is characterized by a faster read-out operation than with theNAND structure.

With the nonvolatile semiconductor memory according to the fifthembodiment of the present invention, even using the NOR-type circuitstructure, as miniaturization progresses and the floating gate 8 is athin film, contact resistance decreases, and yield is improved with easyprocessing due to a short-circuit structure utilizing the sidewall gates6 in the select gate transistors.

For securing select gate transistor cut-off characteristics, a structurewith not just one but multiple select gate transistors connected inseries may be employed. Even in that case, as miniaturization progressesand the floating gate 8 is a thin film, contact resistance decreases,and yield is improved with easy processing due to a short-circuitstructure utilizing the sidewall gates 6.

SIXTH EMBODIMENT System Block Structure

The exemplary system block structure of the nonvolatile semiconductormemory according to the first through the third embodiment of thepresent invention as shown in FIG. 31 is configured with a NAND flashmemory cell array 303, a bit line control circuit 301, a row decoder310, a column decoder 302, and a booster circuit 311. The nonvolatilememory cell array described with FIG. 28 may be applied to the NANDflash memory array 303. In other words, in the NAND flash memory cellarray 303, NAND memory cell units 24, each having a multilayer stackedgate structure as a basic memory cell transistor, are vertically andhorizontally arranged in a matrix so as to arrange the word lines WL1 toWLn, which are connected to the respective control gates 2, the bitlines BL1 to BLm, the select gate lines SGD and SGS, and the source lineSL and the like. The bit line control circuit 301 and the row decoder310 are connected to the NAND flash memory cell array 303. The bit linecontrol circuit 301 latches write-in data, performs a sensing operationduring read-out, and performs related operations. The column decoder302, which decodes a column address signal so as to select a NAND cellunit column, is connected to the bit line control circuit 301. Thebooster circuit 311 generates a write-in voltage V_(pgm), differentmultiple intermediate voltages V_(pass1) to V_(passn), and a bit linevoltage V_(b1) and the like from a power supply voltage. The row decoder310 supplies a control signal RDS to the booster circuit 311, andreceives the write-in voltage V_(pgm) and the intermediate voltagesV_(pass1) to V_(passn). It should be noted that the multipleintermediate voltages V_(pass1) to V_(passn) are used for the write-in,read-out and erasure operations for the nonvolatile semiconductor memoryaccording to the embodiments of the present invention, and are mainlyapplied to the word lines WL1 to WLn, respectively. The row decoder 310decodes a row address signal, and based on the voltage supplied from thebooster circuit 311, outputs the decoded signals, such as the write-involtage V_(pgm), which is used to select a memory cell transistor in theNAND flash memory cell array 303, the intermediate voltages V_(pass1) toV_(passn), voltage V_(sgs) to be applied to the select gate line SGS,the voltage V_(sgd) to be applied to the select gate line SGD, and thevoltage V_(s1) to be applied to the source line SL. Accordingly, wordlines and select gate lines in the NAND flash memory cell array 303 areselected. Furthermore, the bit line control circuit 301 receives the bitline voltage V_(b1) from the booster circuit 311, supplying the bit linevoltage V_(b1) to a NAND cell unit column selected by the column decoder302. It should be noted that only the minimum circuit configuration isshown in FIG. 31, and in addition to this configuration, an addressbuffer, a data input/output buffer, and a timing generation circuit andthe like are additional components of the system block, however,descriptions thereof are omitted.

SEVENTH EMBODIMENT

An application example of the nonvolatile semiconductor memory accordingto the first through the sixth embodiment of the present invention, as aseventh embodiment, is illustrated in FIG. 32. FIG. 32 is a schematicdiagram of principal elements of a flash memory and system according tothis embodiment. As shown in the drawing, a flash memory system 142 isconfigured with a host platform 144 and a universal serial bus (USB)flash unit 146.

The host platform 144 is connected to the USB flash unit 146 via a USBcable 148. The host platform 144 is connected to the USB cable 148 via aUSB host connector 150, and the USB flash unit 146 is connected to theUSB cable 148 via a USB flash unit connector 152. The host platform 144has a USB host controller 154, which controls packet transmissionthrough a USB bus.

The USB flash unit 146 includes a USB flash unit controller 156, whichcontrols other elements in the USB flash unit 146 as well as controlsthe interface to the USB bus of the USB flash unit 146; the USB flashunit connector 152; and at least one flash memory module 158 configuredwith the nonvolatile semiconductor memory according to the first throughthe sixth embodiment of the present invention.

When the USB flash unit 146 is connected to the host platform 144,standard USB enumeration processing begins. In this processing, the hostplatform 144 recognizes the USB flash unit 146, selects the mode fortransmission therewith, and conducts reception/transmission of datafrom/to the USB flash unit 146 via a FIFO buffer called an end point,which stores transfer data. The host platform 144 recognizes changes inthe physical and electrical states such as removal/attachment of the USBflash unit 146 via another end point, and receives any existingto-be-received packets.

The host platform 144 requests services from the USB flash unit 146 bysending a request packet to the USB host controller 154. The USB hostcontroller 154 transmits the packet to the USB cable 148. If the USBflash unit 146 is a unit including the end point that has received therequest packet, the request will be accepted by the USB flash unitcontroller 156.

Next, the USB flash unit controller 156 performs various operations suchas read-in, write-in or erasure of data from or to the flash memorymodule 158. In addition, the USB flash unit controller 156 supportsbasic USB functions such as acquiring a USB address and the like. TheUSB flash unit controller 156 controls the flash memory module 158 viaeither a control line 160, which is used to control output from theflash memory module 158, or, for example, other various signals such asa chip enable signal CE, a read-out signal, or a write-in signal.Furthermore, the flash memory module 158 is also connected to the USBflash unit controller 156 via an address data bus 162. The address databus 162 transfers a read-out, a write-in or an erasure command for theflash memory module 158, and the address and data for the flash memorymodule 158.

In order to notify the host platform 144 of the results and status ofthe various operations requested by the host platform 144, the USB flashunit 146 transmits a status packet using a status end point (end point0). In this processing, the host platform 144 checks (polls) for theexistence of a status packet, and the USB flash unit 146 returns anempty packet or a status packet when there is no packet for a new statusmessage.

As described thus far, various functions of the USB flash unit 146 maybe implemented. Directly connecting the connectors is also possible byomitting the USB cable 148 described above.

OTHER EMBODIMENTS

As described above, the present invention is described according tovarious embodiments, however, it should not be perceived thatdescriptions and drawings forming a part of this disclosure are intendedto limit the spirit and scope of the present invention. Variousalternative embodiments, working examples, and operational techniqueswill become apparent from this disclosure for those skills in the art.Accordingly, the technical scope of the present invention is determinedonly by specified features of the invention according to the followingclaims that can be regarded appropriate from the above-mentioneddescriptions. In addition, the embodiments of the present invention canbe modified and implemented in various ways as long as not deviatingfrom the scope of the present invention. The present invention naturallyincludes various embodiments not described herein.

1. A fabrication method for a nonvolatile semiconductor memorycomprising: forming a polysilicon layer for floating gates, and thenforming an etching trench for device isolating region formation byselectively removing the polysilicon layer for floating gates; forming adevice isolating region by depositing an insulator film across theentire surface of the device for filling in the etching trench, and thenplanarizing until exposing the polysilicon layer for floating gates;successively depositing an inter-gate insulating film, a control gate,and a mask insulator film across the entire planarized surface;successively removing select gate transistors in an area other than amemory cell transistor area, the mask insulator in a peripheraltransistor area, the control gate, and the inter-gate insulator film,and then etching the filling material of the device isolating regionsuch that the surface of the device isolating region can be at a lowerposition than the bottom of the inter-gate insulator film; depositing aconductive material for sidewall gates across the entire surface of thedevice, and then leaving only sidewall gates by selective etching; andforming isolated memory cell transistor areas and select gate transistorareas.
 2. A fabrication method for a nonvolatile semiconductor memorycomprising: forming a polysilicon layer for floating gates, and thenforming an etching trench for device isolating region formation byselectively removing the polysilicon layer for the floating gates;forming a device isolating region by depositing an insulator film acrossthe entire surface of the device for filling in that etching trench, andthen planarizing until exposing the polysilicon layer for the floatinggates; successively depositing an inter-gate insulating film, a controlgate, and a mask insulator film across the entire planarized surface;successively removing select gate transistors in an area other than amemory cell transistor area, the mask insulator in a peripheraltransistor area, the control gate, and the inter-gate insulator film,and then etching the filling material of the device isolating regionsuch that the surface of the device isolating region is at a lowerposition than the bottom of the inter-gate insulator film; depositing aconductive material for sidewall gates, and then etching until exposingthe surface of the mask insulator film, and stopping the etching processat the top of the floating gates so as to form sidewall gates; andforming isolated memory cell transistor areas and select gate transistorareas.
 3. A fabrication method for a nonvolatile semiconductor memoryincluding a memory cell transistor and a select gate transistor,comprising: successively forming a first gate insulator film, a firstconductor layer, a second gate insulator film, a second conductor layerand a mask film on a semiconductor substrate; successively removing themask film, the second conductor layer and the second gate insulator filmso as to expose an upper surface of the first conductor layer and a sidesurface of the second conductor layer, in a first region where a sidegate electrode of the select gate transistor is formed; forming a thirdconductor layer on the upper surface of the first conductor layer andthe side surface of the second conductor layer; and removing the maskfilm, the second gate insulator film and the first conductor film in asecond region except the first region, while leaving the third conductorlayer, so as to form a first gate electrode of the memory celltransistor including a floating gate and a control gate and a secondgate electrode of the select gate transistor including a first portionwhere the second insulator film is located between the first and thesecond conductor layers and a second portion where the side gateelectrode is located between the first and the second conductor layers.4. The method of claim 3, further comprising forming a conductive oxidefilm between the side gate electrode and the upper surface of the firstconductor layer and the side surface of the second conductor layer. 5.The method of claim 3, wherein the first, second and the third conductorlayer include a polysilicon film.